Plasmon Enhanced Photonics



Centre Suisse d’Eléctronique et Microtechnologie SA


Jaquet Droz 1, Neuchâtel, CH 2002 Switzerland.



CSEM SA (Centre Suisse d’Electronique et de Microtechnique S.A.) is a privately held, knowledge-based company established in 1984 in Neuchâtel, Switzerland. It has currently 249 employees at three sites (Neuchâtel, Zürich and Alpnach). CSEM SA is mainly active in the fields of micro/nanotechnology, microelectronics, systems engineering, information and communication technologies and carries out applied research, development and prototyping.


The proposed work is particularly linked to CSEM’s MOEMS and Image Sensor activities. Its expertise in the fields of integrated photonic devices like mechanical activated optical micro-switches, photonic crystals, novel integrated waveguides, near-field optics and OLED technology, which comprises different cost-effective fabrication processes and simulation capabilities provides a strong base for development of integrated plasmon light sources and detectors. In turn the exploitation of plasmon effects will help directly to improve current polymeric optoelctronic devices. CSEM is an active partner in the FP6 Network of Excellence Plasmon-nano-devices.

Description of resources

  • Microfabrictation facilities: 600 m2 of silicon and surface micromachining cleanrooms.

  • Microscopy: AFM, SNOM, SEM, ESEM, confocal.

  • LED and photodetector characterisation facilities.

  • Image sensor design. Electromagnetic simulation tools for LED emission, waveguides and particle scattering.

  • Key personnel: Ross Stanley & Rolf Eckert

Publications and / or patents

R. Stanley, M. Kiy, L. Bürgi, C. Winnewisser and H. Heinzelmann; "Localised emission in microcavity polymer light emitting diodes with metallic mirrors" Surface Plasmon Photonics SPP-2, 21-26 May 2005, Graz, Austria.

D. Falconnet, D. Pasqui, P. Sunggook, R. Eckert, H. Schift, J. Gobrecht, R. Barbucci and M. Textor; "A Novel Approach to Produce Protein Nanopatterns by Combining Nanoimprint Lithography and Molecular Self-Assembly" Nano Lett. 4 (2004) 1909.

R. Eckert, J. M. Freyland, H. Gersen, H. Heinzelmann, G. Schürmann, W. Noell, U. Staufer and N. F. de Rooij; "Near-field fluorescence imaging with 32 nm resolution based on microfabricated cantilevered probes" Appl. Phys. Lett. 77 (2000) 3695.

R. Eckert; "Fabrication of plasmonic structures by micro-contact printing" 3rd Research Workshop on Plasmo-Nano-Devices, 26 Mai 2005, Graz, Austria.

T. Huser, T. Lacoste, R. Eckert and H. Heinzelmann; "Observation and analysis of near-field optical diffraction" J. Opt. Soc. Am. A 16 (1999) 141


© 2009 Plasmon Enhanced Photonics